Electron Spectroscopy, 5 op

Ydinsisältö

• Surface analysis and surface sensitivity: Principles of surface analytical research. Instrumentation. Surface sensitivity. Attenuation length and information depth. Application examples of surface analysis.
• X-ray photoelectron spectroscopy (XPS): Spectral features and chemical shifts. XPS as an analytical method. Quantitative analysis.
• Auger electron spectroscopy (AES): Auger-transition. AES as an analytical method. Comparison of XPS and AES methods. Depth profiling. Quantitative analysis.
• Ultra-violet photoemission spectroscopy (UPS): Photon sources and surface sensitivity of UPS. Orientation and symmetry of adsorbed molecules.
  
• X-ray absorption spectroscopy (XAS): Synchrotron radiation and surface science. NEXAFS and EXAFS methods.

Täydentävä tietämys

• Vacuum technology. Energy analysers. Role of emission angle to information depth.
• Photon sources. X-ray lines and X-ray satellites. Three-step model of photoemission. Adiabatic approximation. Koopman's theorem.
• X-ray fluorescence yield versus Auger electron yield. Energy of the Auger transition.
• Fermi's Golden Rule. Dipole matrix element. Character table. Polarization. Surface molecule point groups. Polarization-dependent selection rules.
• Analysis of EXAFS spectrum.

Erityistietämys

• Concentric Hemispherical Analyser. Spectromicroscopy.
• Intrinsic and extrinsic processes of photoemission. Many-electron effects in photoemission. Nanostructures on surfaces.
• Carbon KVV-transition. Ionisation cross-section.
• ARUPS CO/Ni(100).
• XAS of Cu oxides.